Crystallographic structure of gold films electrodeposited at low current densities

Journal of Materials Science

Volumn 37, Issue 18, 2002, Pages 3903-3913

  Bozzini, B ^a   Giovanelli, G ^b   Natali, S ^b   Fanigliulo, A ^a   Cavallotti, P L ^c  

^a INFM   (Italy)

^b SAPIENZA UNIVERSITY OF ROME   (Italy)

^c POLITECNICO DI MILANO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; CRYSTAL STRUCTURE; CURRENT DENSITY; CYANIDES; ELECTRODEPOSITION; METALLIC FILMS; PASSIVATION; PLATING; RAMAN SPECTROSCOPY; SPECTROSCOPIC ANALYSIS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

BATHS; CATHODIC PASSIVATION; CRYSTALLOGRAPHIC STRUCTURE; VOLTAMMOGRAMS;

GOLD ALLOYS;

EID: 0037106816     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1019655522750     Document Type: Article

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