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Volumn 91, Issue 10 I, 2002, Pages 8789-8791
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Growth characteristics of Al oxide formed by ozone in magnetic tunnel junctions
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Author keywords
[No Author keywords available]
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Indexed keywords
AL OXIDE;
ALUMINUM OXIDATION;
ANGLE-RESOLVED XPS;
BARRIER LAYERS;
BIAS CONDITIONS;
CROSS-SECTIONAL TEM;
GROWTH CHARACTERISTIC;
ION MIGRATION;
JUNCTION RESISTANCES;
MAGNETIC TUNNEL JUNCTION;
MAGNETORESONANCE;
NEGATIVE BIAS;
OXIDATION KINETICS;
OXIDATION PROCESS;
OXIDE LAYER;
OXIDE THICKNESS;
OXYGEN CONTENT;
OXYGEN MIXTURES;
OZONE GAS;
POSITIVE BIAS;
RATE-CONTROLLING STEPS;
TRANSMISSION ELECTRON MICROSCOPY TEM;
ALUMINUM;
ELECTRON TUNNELING;
MAGNETIC DEVICES;
OXIDATION;
OZONE;
OZONE RESISTANCE;
PHOTOELECTRONS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY PHOTOELECTRON SPECTROSCOPY;
OZONE LAYER;
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EID: 0037095076
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1447210 Document Type: Article |
Times cited : (16)
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References (11)
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