Effect of precursor on overcoat properties in ion beam carbon process

Journal of Applied Physics

Volumn 91, Issue 10 I, 2002, Pages 7562-7564

  Pirzada, Shahid ^a   Liu, Jia J ^a   Li, Fred ^a   Demczyk, Brian ^a   Spaulding, Dave ^a  

^a MAXTOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AREAL DENSITIES; CARBON DEPOSITION; CORROSION-RESISTANT; DIFFERENT PRECURSORS; HYDROGEN CONTENTS; ION BEAM DEPOSITION; MAGNETIC MEDIA; MECHANICAL INTEGRITY; THIN CARBON FILMS; ULTRA-THIN;

ACETYLENE; CARBON FILMS; CHEMICAL MODIFICATION; CHEMICAL VAPOR DEPOSITION; ETHANE; ETHYLENE; ION BEAMS; LIGHTING; ORGANIC COMPOUNDS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

CARBON;

EID: 0037095016     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1452687     Document Type: Article

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