Hydrogen permeation barrier performance characterization of vapor deposited amorphous aluminum oxide films using coloration of tungsten oxide

Surface and Coatings Technology

Volumn 153, Issue 2-3, 2002, Pages 114-118

  Yamada Takamura, Y ^a   Koch, F ^b   Maier, H ^b   Bolt, H ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

Aluminum oxide; Filtered arc; Hydrogen; Tungsten oxide

Indexed keywords

ALUMINA; HYDROGEN; INFRARED SPECTROSCOPY; MECHANICAL PERMEABILITY; METALLIC FILMS; REDUCTION; SOLUBILITY; SUBSTRATES; VACUUM APPLICATIONS; VAPOR DEPOSITION;

BARRIER COATINGS;

AMORPHOUS FILMS;

FILM; HYDROGEN; MEMBRANE; PERMEATION; TUNGSTEN; VAPOR DEPOSITION;

EID: 0037090896     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01697-8     Document Type: Article

References (12)