Novel process for electrodeposition of Bi2S3 thin films

Materials Chemistry and Physics

Volumn 73, Issue 2-3, 2002, Pages 306-309

  Saitou, M ^a   Yamaguchi, R ^a   Oshikawa, W ^a  

^a UNIVERSITY OF THE RYUKYUS   (Japan)

Author keywords

Bi2S3; Complexing agent; Diffusion control; Electrodeposition; X ray diffraction

Indexed keywords

BISMUTH COMPOUNDS; DIFFUSION; ELECTRODEPOSITION; NEGATIVE IONS; ORGANIC ACIDS; STOICHIOMETRY; X RAY DIFFRACTION ANALYSIS;

ELECTROCHEMICAL DEPOSITION;

THIN FILMS;

EID: 0037081313     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(01)00394-7     Document Type: Article

References (9)