Electron spin resonance of ultrafine Si particles

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 3 A, 1999, Pages 1300-1302

  Dohi, Minoru ^a   Yamatani, Hiroshi ^a   Fujita, Tetsuo ^a  

^a SHIZUOKA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

ESR; EX center; New defect; Silicon; Ultrafine particle

Indexed keywords

ACTIVATION ENERGY; CRYSTAL DEFECTS; DEPOSITION; ELECTRON SPIN RESONANCE SPECTROSCOPY; HEAT TREATMENT; PARTICLE SIZE ANALYSIS; PASSIVATION; SILICA; VACUUM DEPOSITED COATINGS;

ELECTRON SPIN RESONANCE SIGNAL; ULTRAFINE PARTICLES;

SEMICONDUCTING SILICON;

EID: 0032677691     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.1300     Document Type: Article

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