Epitaxy stabilised CaF 2 -type ternary Co 1-x Fe x Si 2 silicides on Si(1 1 1): DAFS and HRTEM measurements

Applied Surface Science

Volumn 188, Issue 1-2, 2002, Pages 146-150

  Ersen, O ^a   Pierron Bohnes, V ^a   Ulhaq Bouillet, C ^a   Pirri, C ^b   Tuilier, M H ^b   Berling, D ^b   Bertoncini, P ^b   Gailhanou, M ^c   Thiaudiere D ^c  

^a INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

^b UNIVERSITÉ DE HAUTE ALSACE   (France)

^c UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

DAFS; Epitaxy on silicon; Metastable phases; Silicides; Stress

Indexed keywords

ANNEALING; CRYSTALLOGRAPHY; EPITAXIAL GROWTH; FILM GROWTH; MORPHOLOGY; NUCLEATION; PHASE SEPARATION; TERNARY SYSTEMS; TRANSMISSION ELECTRON MICROSCOPY;

SILICIDES;

COBALT COMPOUNDS;

EID: 0037070666     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00724-3     Document Type: Article

References (10)