Erbium-doped optical waveguide materials based on Si nanocrystals formed by metal vapour vacuum arc ion implantation

Journal of Physics Condensed Matter

Volumn 14, Issue 44 SPEC ISS., 2002, Pages 11315-11320

  Xiao, Zhisong ^a,b   Xu, Fei ^c   Zhang, Tonghe ^a,b   Cheng, Guoan ^a,b   Gu, Lanlan ^c  

^a BEIJING NORMAL UNIVERSITY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

^c FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ERBIUM; INTERFACES (MATERIALS); ION IMPLANTATION; ION SOURCES; OPTICAL WAVEGUIDES; PHOTOLUMINESCENCE; RAPID THERMAL ANNEALING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

EXCITATION ENERGY; METAL VAPOR VACUUM ARC ION IMPLANTATION; OPTICAL WAVEGUIDE MATERIAL; SILICON NANOCRYSTAL; THERMALLY GROWN SILICA FILM;

NANOSTRUCTURED MATERIALS;

EID: 0037064823     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/14/44/474     Document Type: Article

References (8)

1. Canham L T 1990 Appl. Phys. Lett. 57 1046
2. Coffa S, Franzo G, Priolo F, Polman A and Serna R 1994 Phys. Rev. B 49 16313
3. Stepikhova M, Palmetshofer L, Jantsch W. Von Bardeleben H J and Gaponenko N V 1999 Appl. Phys. Lett. 74 537
4. Kenyon J, Trwoga P F, Pitt C W and Rehm C 1996 J. Appl. Phys. 79 9291
5. Franzo G, Priolo F and Coffa S 1999 J. Lumin. 80 19
6. Coffa S, Franzo G and Priolo F 1998 MRS Bull. 25
7. Brongersma M L, Polman A, Min K S, Boer E, Tambo T and Atwater A 1998 Appl. Phys. Lett. 72 2577
8. Zhang Yanwen, Zhang Tonghe, Xiao Zhisong and Whitlow H J 2001 Nucl. Instrum. Methods B 173 427