Molecular-scale non-contact AFM studies of ferroelectric organic thin films epitaxially grown on alkali halides

Surface Science

Volumn 516, Issue 1-2, 2002, Pages 103-108

  Fukuma, T ^a   Kobayashi, K ^a   Noda, K ^a   Ishida, K ^a   Horiuchi, T ^a   Yamada, H ^a   Matsushige, K ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Alkali halides; Atomic force microscopy; Epitaxy; Insulating surfaces; Surface structure, morphology, roughness, and topography

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROSTATICS; EPITAXIAL GROWTH; PLASTIC FILMS; SURFACE CHEMISTRY; SURFACE ROUGHNESS; SURFACE TOPOGRAPHY;

ELECTROSTATIC INTERACTION;

FERROELECTRIC THIN FILMS;

EID: 0037056229     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(02)01876-9     Document Type: Article

References (18)