Evaluation of the adhesion of TiN films using nanoindentation and scratch testing

Philosophical Magazine A: Physics of Condensed Matter, Structure, Defects and Mechanical Properties

Volumn 82, Issue 10, 2002, Pages 2191-2197

  Toparli, Mustafa ^a   Sasaki, Shinya ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ELASTICITY; FINITE ELEMENT METHOD; FRICTION; INDENTATION; NUMERICAL METHODS; PHYSICAL VAPOR DEPOSITION; SILICON WAFERS; THIN FILMS;

ELASTIC STRESS DISTRIBUTION; NANOINDENTATION TESTING; SCRATCH TESTING;

TITANIUM NITRIDE;

EID: 0037055299     PISSN: 01418610     EISSN: None     Source Type: Journal    
DOI: 10.1080/01418610208235729     Document Type: Article

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