Efficient surface passivation by silicon nitride using a large area deposition system

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2002, Pages 262-265

  Kintzel, W ^a   Bail, M ^a   Auer, R ^a   Brendel, R ^a  

^a BAVARIAN CENTER FOR APPLIED ENERGY RESEARCH ZAE BAYERN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY OF SOLIDS; OPTIMIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; SURFACE PROPERTIES; THERMAL EFFECTS;

LIFETIME MEASUREMENTS; REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE FILMS; SURFACE PASSIVATION; SURFACE RECOMBINATION VELOCITY;

SILICON WAFERS;

EID: 0036956954     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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