Characterization of a-SiCx:H films for c-Si surface passivation

Materials Research Society Symposium - Proceedings

Volumn 715, Issue , 2002, Pages 539-546

  Vetter, M ^a   Martin, I ^a   Orpella, A ^a   Voz, C ^a   Puigdollers, J ^a   Alcubilla, R ^a  

^a UNIVERSITAT POLITÈCNICA DE CATALUNYA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; AMORPHOUS FILMS; CHEMICAL BONDS; DOPING (ADDITIVES); MIXTURES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE PHENOMENA; VELOCITY;

AMORPHOUS INTRINSIC SILICON CARBIDE; CRYSTALLINE SILICON; INFRARED TRANSMISSION SPECTRA; SURFACE PASSIVATION;

SILICON CARBIDE;

EID: 0036924264     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-715-a24.5     Document Type: Conference Paper

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