Valence Band Density of States of Cu3Si Studied by Soft X-Ray Emission Spectroscopy and a First-Principle Molecular Orbital Calculation

Journal of the Physical Society of Japan

Volumn 71, Issue 12, 2002, Pages 2948-2952

  An, Zhenlian ^a   Kamezawa, Chihiro ^a   Hirai, Masaaki ^a   Kusaka, Masahiko ^a   Iwami, Motohiro ^a  

^a OKAYAMA UNIVERSITY   (Japan)

Author keywords

Cluster calculation; Cu 3Si; Discrete variation X method; Soft X ray emission spectroscopy; Valence band density of states

Indexed keywords

COPPER DERIVATIVE; SILICON DERIVATIVE;

ARTICLE; CALCULATION; CHEMICAL BINDING; CLUSTER ANALYSIS; DENSITY; ELECTRON; ENERGY; SOFT X RAY EMISSION SPECTROSCOPY; SPECTROSCOPY; SPECTRUM; THEORY;

EID: 0036919606     PISSN: 00319015     EISSN: None     Source Type: Journal    
DOI: 10.1143/JPSJ.71.2948     Document Type: Article

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