Microstructure characterization of a-Si based alloys by effusion of implanted helium

Materials Research Society Symposium - Proceedings

Volumn 715, Issue , 2002, Pages 387-392

  Beyer, Wolfhard ^a   Finger, Friedhelm ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; CRYSTAL MICROSTRUCTURE; ENERGY GAP; HELIUM; ION IMPLANTATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THERMAL EFFECTS;

EFFUSION; MICROCRYSTALLINE SILICON;

AMORPHOUS SILICON;

EID: 0036918655     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-715-a5.1     Document Type: Conference Paper

References (9)

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