Waferstepper alignment for MEMS applications using diffraction gratings

Materials Research Society Symposium - Proceedings

Volumn 729, Issue , 2002, Pages 235-240

  Van Zeijl, H W ^a   Simon, K ^b   Slabbekoorn, J ^a   Buel, W V ^b   Gui, C Q ^b  

^a Submicron Technologies   (Netherlands)

^b ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; ETCHING; MICROMACHINING; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE TESTING; THICK FILMS;

BACKWAFER ALIGNMENT; BULK MICRO MACHINING; STEPPER ALIGNMENT SYSTEM; WAFERSTEPPER;

MICROELECTROMECHANICAL DEVICES;

EID: 0036917603     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-729-u5.8     Document Type: Conference Paper

References (3)

1. S. Wittekoek, J. van der Werf, R.A. George, Phase gratings as wafer stepper alignment marks for all process layers, Optical Microlithography IV, SPIE Vol. 538, 1985, pp. 24 - 31.
2. H. W. van Zeijl, J. Slabbekoorn, L.K. Nanver, P. W. L. van Dijk, A. Berthold, T. Machielsen, Proceedings of SPIE, Vol. 4181, September 2000, pp. 200-207.
3. H. W. van Zeijl, J. Slabbekoorn, Proceedings of the 1st international conference on semiconductor technology, The electrochemical society, Vol. 2001-17, May 2001, pp 356-367