Backwafer optical lithography and wafer distortion in substrate transfer technologies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4181, Issue 1, 2000, Pages 200-207

  van Zeijl, H W ^a   Slabbekoorn, J ^a   Nanver, L K ^a   van Dijk, P W L ^b   Berthold, A ^a   Machielsen, T ^c  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b ASML   (Netherlands)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Alignment markers; Overlay accuracy; Substrate distortion; Substrate transfer; Waferstepper matching

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; PROCESS ENGINEERING; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; SUBSTRATES;

WAFER DISTRIBUTION;

PHOTOLITHOGRAPHY;

EID: 0034548117     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.395730     Document Type: Article

References (0)