Spectroscopy of ECR plasma used for depositing amorphous and microcrystalline silicon films

Materials Research Society Symposium - Proceedings

Volumn 715, Issue , 2002, Pages 521-526

  Pontoh, Marsela ^a   Dalal, Vikram L ^a   Gandhi, Neha ^a  

^a Iowa State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; AMORPHOUS FILMS; DENSITY (OPTICAL); ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; MASS SPECTROMETRY; MIXTURES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS;

ELECTRON CYCLOTRON RESONANCE PLASMA; LANGMUIR PROBE MEASUREMENTS; MICROCRYSTALLINE SILICON FILMS; OPTICAL EMISSION SPECTROSCOPY;

AMORPHOUS SILICON;

EID: 0036909583     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-715-a19.6     Document Type: Conference Paper

References (9)

1. V. L. Dalal, E. X. Ping, S. Kaushal, M. Bhan, and M. Leonard, Appl. Phys. Lett., 64, 1862 (1994)
2. V. L. Dalal, S. Kaushal, R. Girvan, S. Hariasra and L. Sipahi, Proc. of 25th. IEEE Photovolt. Spec. Conf., p. 1069 (1996)
3. V. L. Dalal and S. Kaushal, E. X. Ping, J. Xu, R. Knox and K. Han, Proc. of Mater. Res. Soc. 377, 137 (1995)
4. V. L. Dalal and K. Erickson, Proc. Of MRS, Vol. 609(2000)
5. S. Kaushal, V. L. Dalal and J. Xu, J. Non-Cryst. Solids, 198-200, 563 (1996)
6. V. L. Dalal, S. Haroon, Zhiyang Zhou, T. Maxson and K, Han, J.Non-Cryst. Solids, 266,675 (2000)
7. J. Herrold and V. L. Dalal, J.Non-Cryst. Solids., 270, 255 (2000)
8. R. Knox, V. L. Dalal, B. Moradi and G. Chumanov, J.Vac.Sci.Tech. A11, 1896 (1993)
9. M. deFreese, V. L. Dalal and J. Falter, Proc. Of MRS, Vol. 664, A5.2 (2001)