Role of the conducting layer substrate on TiO2 nucleation when using microwave activated chemical bath deposition

Semiconductor Science and Technology

Volumn 17, Issue 12, 2002, Pages 1218-1222

  Zumeta, I ^a   Espinosa, R ^a,c   Ayllon J A ^b   Vigil, E ^a  

^a UNIVERSITY OF HAVANA   (Cuba)

^b UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^c Granma University   (Cuba)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; DEPOSITION; GLASS; MICROWAVE OVENS; NANOSTRUCTURED MATERIALS; NUCLEATION; SOLAR CELLS; X RAY SPECTROSCOPY;

CHEMICAL BATH DEPOSITION;

TITANIUM DIOXIDE;

EID: 0036901950     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/17/12/303     Document Type: Article

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