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Volumn 197, Issue 3-4, 2002, Pages 265-270

Damage of alumina films by medium energy hydrogen and helium ions

Author keywords

Aluminium; Beam damage; Films; Helium; Hydrogen; Oxide

Indexed keywords

ALUMINA; CONDENSATION; INTERFACES (MATERIALS); IRRADIATION; SCANNING ELECTRON MICROSCOPY; SURFACE PHENOMENA; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0036896465     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)01486-6     Document Type: Article
Times cited : (4)

References (15)
  • 3
    • 0004327441 scopus 로고    scopus 로고
    • IBM Corporation, Yorktown Heights, New York, USA
    • J.F. Ziegler, TRIM code, IBM Corporation, Yorktown Heights, New York, USA (URL - http://www.srim.org).
    • TRIM code
    • Ziegler, J.F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.