Epitaxial growth of CeO2 on (100) InP using reactive r.f. magnetron sputtering

Applied Physics A: Materials Science and Processing

Volumn 75, Issue 6, 2002, Pages 699-702

  Ivill, M ^a   Patel, M ^a   Kim, K ^a   Bae, H ^a   Pearton, S J ^a   Norton, D P ^a   Budai, J D ^b  

^a UNIVERSITY OF FLORIDA   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; MOLECULAR ORIENTATION; NUCLEATION; OXIDATION; SEMICONDUCTING INDIUM PHOSPHIDE; SUBSTRATES; THIN FILMS; VAPOR PRESSURE; X RAY DIFFRACTION ANALYSIS;

OXIDE FILMS;

CERIUM COMPOUNDS;

EID: 0036887345     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390201411     Document Type: Article

References (11)