In situ growing and etching of carbon nanotubes on silicon under microwave plasma

Journal of Materials Science Letters

Volumn 21, Issue 21, 2002, Pages 1709-1711

  Tsai, S H ^a   Shiu, C T ^a   Lai, S H ^a   Chan, L H ^a   Hsieh, W J ^a   Shih, H C ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

LOW TEMPERATURE EFFECTS; MICROWAVES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; SILICON; SYNTHESIS (CHEMICAL); SYNTHETIC DIAMONDS; X RAY DIFFRACTION ANALYSIS;

MICROWAVE PLASMA;

CARBON NANOTUBES;

EID: 0036860049     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1020845314174     Document Type: Article

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