Anomalous RF sputtering in a high magnetic field: The effect of high magnetic fields on the growth of Fe-Si-O films

Thin Solid Films

Volumn 389, Issue 1-2, 2001, Pages 51-55

  Bai, H L ^a,b   Mitani, S ^b,c   Wang, Z J ^b   Fujimori, H ^b   Motokawa, M ^b,c  

^a TIANJIN UNIVERSITY   (China)

^b TOHOKU UNIVERSITY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

High magnetic field; Magnetic films; Orientation effects; RF sputtering

Indexed keywords

ARGON; BINARY MIXTURES; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; IRON COMPOUNDS; MAGNETIC FIELD EFFECTS; OXYGEN; SPUTTER DEPOSITION;

ANOMALOUS RADIO FREQUENCY SPUTTERING;

MAGNETIC FILMS;

EID: 0035876799     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)00881-1     Document Type: Article

References (10)