Diffusion of as ions and self-diffusion in silicon during implantation

Technical Physics

Volumn 47, Issue 10, 2002, Pages 1333-1336

  Demakov, K D ^a   Starostin, V A ^a   Shemardov, S G ^a  

^a KURCHATOV INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0036805049     PISSN: 10637842     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.1514818     Document Type: Article

References (12)

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