Mechanical vibration assisted plasma etching for etch rate and anisotropy improvement

Precision Engineering

Volumn 26, Issue 4, 2002, Pages 442-447

  Takeshi, Hatsuzawa ^a   Masanori, Hayase ^a   Toshiaki, Oguchi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Anisotropy; Etch rate; Vibration assisted plasma etching

Indexed keywords

ANISOTROPY; PLASMA COLLISION PROCESSES; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; ULTRASONICS; VIBRATIONS (MECHANICAL);

ETCH RATE;

PLASMA ETCHING;

EID: 0036776670     PISSN: 01416359     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0141-6359(02)00151-4     Document Type: Article

References (4)

1. 3 gas mixtures
2. 2 gas mixtures
3. Dry etching with gas chopping without rippled sidewalls