Selective deposition of gold nanoclusters on silicon by a galvanic displacement process

Microelectronic Engineering

Volumn 64, Issue 1-4, 2002, Pages 479-485

  Magagnin, L ^a   Bertani, V ^a   Cavallotti, P L ^a   Maboudian, R ^b   Carraro, C ^b  

^a POLITECNICO DI MILANO   (Italy)

^b University of California   (United States)

Author keywords

AOT; Cluster; Galvanic displacement; Gold; Microemulsion; Silicon

Indexed keywords

DEPOSITION; GOLD; MICELLES; MICROEMULSIONS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SOLUTIONS; SUBSTRATES; SURFACE ACTIVE AGENTS; X RAY DIFFRACTION ANALYSIS;

NANOCLUSTERS;

NANOSTRUCTURED MATERIALS;

EID: 0036776635     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00824-9     Document Type: Conference Paper

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