Fabrication of magnetic dot arrays by ion beam induced chemical vapor deposition (IBICVD)

IEEE Transactions on Magnetics

Volumn 38, Issue 5 I, 2002, Pages 2589-2591

  Lapicki, Adam ^a,b   Kang, Kyongha ^a   Suzuki, Takao ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b UNIVERSITY OF NOTRE DAME   (United States)

Author keywords

Cobalt; Ion beam applications; Magnetic materials; Nanotechnology

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ION BEAMS; POSITIVE IONS; TRANSMISSION ELECTRON MICROSCOPY;

MAGNETIC FORCE MICROSCOPY (MFM);

MAGNETIC MATERIALS;

EID: 0036762342     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2002.803224     Document Type: Article

References (4)

1. A. Lapicki, E. Ahmad, and T. Suzuki, "Ion beam-induced chemical vapor deposition (IBICVD) of cobalt particles," J. Magn. Magn. Mater., vol. 240, no. 1-3, pp. 47-49, Mar. 2002.
2. B.D. Terris, L. Folks, D. Weller, J.E.E. Baglin, A.J. Kellock, H. Rothuizen, and P. Vettiger, "Ion-beam patterning of magnetic films using stencil masks," Appl. Phys. Lett., vol. 75, pp. 403-405, 1999.
3. J. Melngailis and P.G. Blauner, "Focused ion beam induced deposition," in Proc. Material Research Soc. Symp., vol. 147, 1989, pp. 111-125.
4. A. Lapicki, E. Ahmad, and T. Suzuki, "Ion irradiation effects on magnetic properties of CoPt nanodots fabricated by focused ion beam milling," in Proc. 25th Conf. Magnetics in Japan, Akita, Japan, Sept. 28, 2001, p. 249.