Scheme for generating a superposition of two- and four-photon maximally entangled states: Application to four-photon quantum photolithography

Physical Review A - Atomic, Molecular, and Optical Physics

Volumn 66, Issue 3, 2002, Pages 338041-338046

  Gerry, Christopher C ^a   Benmoussa, A ^a  

^a CITY UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; COMPUTER SIMULATION; DIELECTRIC MATERIALS; DIFFRACTION; HAMILTONIANS; LASER BEAMS; LIGHT INTERFERENCE; LIGHT REFLECTION; MULTIPHOTON PROCESSES; OPTICAL BEAM SPLITTERS; PARAMETRIC AMPLIFIERS; PERTURBATION TECHNIQUES; PHOTOLITHOGRAPHY; PHOTONS; PROBABILITY DISTRIBUTIONS;

FOUR-PHOTON QUANTUM PHOTOLITHOGRAPHY; QUANTUM INTERFERENCE PHENOMENA;

QUANTUM THEORY;

EID: 0036756938     PISSN: 10502947     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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