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Volumn 13, Issue 9, 2002, Pages 531-535

The growth of thin films of copper chalcogenide films by MOCVD and AACVD using novel single-molecule precursors

Author keywords

[No Author keywords available]

Indexed keywords

COPPER COMPOUNDS; MASS SPECTROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR SPECTROSCOPY; PRESSURE EFFECTS; THIN FILMS;

AEROSOL ASSISTED CHEMICAL VAPOR DEPOSITION; COPPER CHALCOGENIDE;

FILM GROWTH;

EID: 0036755377 PISSN: 09574522 EISSN: None Source Type: Journal
DOI: 10.1023/A:1019665428255 Document Type: Article

Times cited : (84)

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