Is LaAlO3 a viable substrate for the deposition of high quality thin films of YBa2Cu3O7-δ?

Superconductor Science and Technology

Volumn 15, Issue 9, 2002, Pages 1335-1339

  Koren, Gad ^a   Polturak, Emil ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; HIGH PRESSURE EFFECTS; LANTHANUM COMPOUNDS; LASER ABLATION; SPUTTERING; YTTRIUM BARIUM COPPER OXIDES;

DEFECT STRUCTURES;

SUPERCONDUCTING FILMS;

EID: 0036737407     PISSN: 09532048     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-2048/15/9/311     Document Type: Article

References (6)

1. Simon R W, Platt C E, Lee A E, Daly K P, Wire M S, Luine J A and Urbanik M 1988 Appl. Phys. Lett. 53 2677.
2. Romanofsky R R, Warner J D, Alterovitz S A, Covey L, Smith A, Newman P and Duh G 2000 IEEE Trans. Microw. Theory Tech. 48 1216.
3. Hong J S, Lancaster M J, Jedamzik D, Greed R B and Mage J C 2000 IEEE Trans. Microw. Theory Tech. 48 1240.
4. Koren G 1993 Physica C 209 369.
5. Koren G, Levy N, Polturak E and Koral Y 2000 Appl. Supercond. 2 903.
6. Koren G, Polturak E, Levy N, Deutscher G and Zakharov N 1998 Appl. Phys. Lett. 25 3763.