Deposition of diamond-like carbon using compact electron-beam-excited plasma source

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 8, 2002, Pages 5408-5414

  Tada, Shigekazu ^a   Ito, Masafumi ^a   Hamagaki, Manabu ^b   Hori, Masaru ^c   Goto, Toshio ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b WAKAYAMA UNIVERSITY   (Japan)

^c INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

Author keywords

Diamond like carbon; Electron beam excited plasma; Overcoat; Plasma CVD; Recording media; Ultrathin film

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; ELECTRIC POTENTIAL; ELECTRON BEAMS; ETHYLENE; ION BOMBARDMENT; IONS; OPTIMIZATION; PLASMA SOURCES; SUBSTRATES; SYNTHESIS (CHEMICAL); TOLUENE;

ELECTRON-BEAM-EXCITED PLASMA (EBEP);

DIAMOND LIKE CARBON FILMS;

EID: 0036698499     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.5408     Document Type: Article

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