Control of roughness in Mo/Al multilayer film fabricated by DC magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 8, 2002, Pages 5338-5341

  Nii, Hajime ^a   Miyagawa, Makoto ^a   Matsuo, Yoshiaki ^a   Sugie, Yosohiro ^a   Niibe, Masato ^a   Kinoshita, Hiroo ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Aluminum; Molybdenum; Multilayer thin film; Reflectivity; Soft X ray

Indexed keywords

ALUMINUM; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; DIFFUSION; ELECTRIC POTENTIAL; ELECTRON DIFFRACTION; LIGHT REFLECTION; LIGHT REFRACTION; MAGNETRON SPUTTERING; MOLYBDENUM; MONOLAYERS; OPTICAL MULTILAYERS; REFLECTOMETERS; SURFACE ROUGHNESS; SYNCHROTRON RADIATION; X RAY OPTICS;

MULTILAYER FILMS;

OPTICAL FILMS;

EID: 0036698028     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.5338     Document Type: Article

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