Fabrication of Mo/Al multilayer films for a wavelength of 18.5 nm

Journal of Synchrotron Radiation

Volumn 5, Issue 3, 1998, Pages 702-704

  Nii, H ^a   Niibe, M ^a   Kinoshita, H ^a   Sugie, Y ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Mo Al; Multilayers; Reflectivity; Soft X rays

Indexed keywords

EID: 0032390405     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049597019407     Document Type: Article

References (6)

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