Process settings and process latitude

Microlithography World

Volumn 11, Issue 3, 2002, Pages

  Mack, Chris A ^a  

^a KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR ANALYSIS; IMAGE CODING; IMAGE QUALITY; MASKS;

CRITICAL DIMENSION (CD) CONTROL;

PHOTORESISTS;

EID: 0036687907     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

References (2)

1. Using the normalized image log-slope, part 6: Development path
2. Using the normalized image log-slope, part 4