Low-resistance Ti/Al ohmic contact on undoped ZnO

Journal of Electronic Materials

Volumn 31, Issue 8, 2002, Pages 868-871

  Kim, Soo Young ^a   Jang, Ho Won ^a   Kim, Jong Kyu ^a   Jeon, Chang Min ^a   Park, Won Il ^a   Yi, Gyu Chul ^a   Lee, Jong Lam ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

Ohmic contact; Photoemission spectroscopy; ZnO

Indexed keywords

ALUMINUM; ANNEALING; ATOMIC SPECTROSCOPY; CARRIER CONCENTRATION; COMPOSITION; CRYSTAL ATOMIC STRUCTURE; ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTRIC RESISTANCE MEASUREMENT; KINETIC ENERGY; OHMIC CONTACTS; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

ATOMIC CONCENTRATION; ATOMIC RATIO; DONORS; ELECTRON CONCENTRATION; SYNCHROTRON RADIATION PHOTOEMISSION SPECTROSCOPY;

ZINC OXIDE;

EID: 0036686534     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-002-0197-1     Document Type: Article

References (12)