Dependence of the strains and residual mechanical stresses on the performances presented by a-Si:H thin film position sensors

Advanced Engineering Materials

Volumn 4, Issue 8, 2002, Pages 612-616

  Fortunato, E ^a   Brida, D ^a   Pereira, L ^a   Aguas H ^a   Silva, V ^a   Ferreira, I ^a   Costa, M F M ^b   Teixeira, V ^b   Martins, R ^a  

^a DEPARTAMENTO DE CIÊNCIA DOS MATERIAIS   (Portugal)

^b UNIVERSITY OF MINHO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOCURRENTS; RESIDUAL STRESSES; STRAIN; SUBSTRATES; THIN FILMS;

CONSTANT PHOTOCURRENT METHOD (CPM);

OPTICAL SENSORS;

EID: 0036671949     PISSN: 14381656     EISSN: None     Source Type: Journal    
DOI: 10.1002/1527-2648(20020806)4:8<612::AID-ADEM612>3.0.CO;2-U     Document Type: Conference Paper

References (9)