Development of elementary arrangement for exterme ultraviolet projection lithography

Guangxue Xuebao/Acta Optica Sinica

Volumn 22, Issue 7, 2002, Pages 852-857

  Jin, Chunshui ^a   Ma, Yueying ^a   Pei, Shu ^a   Cao, Jianlin ^a  

^a CHANGCHUN INSTITUTE OF OPTICS   (China)

Author keywords

Extreme ultraviolet; Extreme ultraviolet projection lithography; Multilayer reflector; Schwarzschild objective

Indexed keywords

COMPUTER AIDED MANUFACTURING; INTEGRATED CIRCUIT MANUFACTURE; OPTICAL DESIGN; ULTRAVIOLET INSTRUMENTS;

EXTREME ULTRAVIOLET; MULTILAYER REFLECTOR; PROJECTION LITHOGRAPHY; SCHWARSHILD OBJECTIVE;

LITHOGRAPHY;

EID: 0036658023     PISSN: 02532239     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

1. Multilayer mirror technology for soft X-ray projection lithography
2. Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet
3. EUV optical design for a 100 nm CD imaging system
4. Three-aspherical system for EUVL lithography
5. Recent results in the development of an integrated EUVL laboratory toll