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Volumn 18, Issue 3, 2002, Pages 313-322

Statistical design of double EWMA controller

Author keywords

Double EWMA (feedback) controller; Optimal discount factors; Process disturbance; Run by run process control; Single EWMA (feedback) controller; Stability conditions

Indexed keywords

CLOSED LOOP CONTROL SYSTEMS; FEEDBACK CONTROL; MATHEMATICAL MODELS; OPTIMIZATION; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE; STABILITY CRITERIA; STATE SPACE METHODS; WHITE NOISE;

EID: 0036657777     PISSN: 15241904     EISSN: None     Source Type: Journal    
DOI: 10.1002/asmb.476     Document Type: Article
Times cited : (34)

References (8)
  • 2
  • 4
    • 0028425441 scopus 로고
    • Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry
    • Butler S.W., Stefani J.A. Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry. IEEE Transactions on Semiconductors Manufacturing 1994; 7:193-201.
    • (1994) IEEE Transactions on Semiconductors Manufacturing , vol.7 , pp. 193-201
    • Butler, S.W.1    Stefani, J.A.2
  • 5
    • 0033321365 scopus 로고    scopus 로고
    • Long-run and transient analysis of a double EWMA feedback controller
    • Del Castillo E. Long-run and transient analysis of a double EWMA feedback controller. IIE Transactions 1999; 31:1157-1169.
    • (1999) IIE Transactions , vol.31 , pp. 1157-1169
    • Del Castillo, E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.