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Volumn 85, Issue 7, 2002, Pages 1860-1866

Oxidation of a silicon nitride-titanium nitride composite: Microstructural investigations and phenomenological modeling

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; HIGH TEMPERATURE EFFECTS; MICROSTRUCTURE; OXIDATION; SILICON NITRIDE; TITANIUM NITRIDE;

EID: 0036647077     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2002.tb00365.x     Document Type: Conference Paper
Times cited : (32)

References (37)
  • 18
    • 0032638772 scopus 로고    scopus 로고
    • Composition, dependence of the kinetics and mechanisms of thermal oxidation of titanium-tantalum alloys
    • (1999) Oxid. Met. , vol.51 , Issue.5-6 , pp. 383-402
    • Park, Y.1    Butt, D.P.2
  • 19
    • 0031211741 scopus 로고    scopus 로고
    • The effects of nitrogen on the kinetics and mechanisms of oxidation of titanium-tantalum alloys
    • (1997) Oxid. Met. , vol.48 , Issue.1-2 , pp. 41-58
    • Hanrahan, R.J.1    Butt, D.P.2
  • 29
    • 0030288285 scopus 로고    scopus 로고
    • Silicon nitride oxidation based on oxynitride interlayers with graded stoichiometry
    • (1996) J. Am. Ceram. Soc. , vol.79 , Issue.11 , pp. 2993-2996
    • Sheldon, B.W.1
  • 33
    • 0031168825 scopus 로고    scopus 로고
    • Transmission electron microscopy investigation of the oxidation of hot isostatically pressed silicon nitride with and without sintering aids
    • (1997) J. Am. Ceram. Soc. , vol.80 , Issue.6 , pp. 1491-1500
    • Meara, C.O.1    Sjoberg, J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.