Predicting pattern transfer distortions during EUV mask fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 840-847

  Reu, Phillip L ^a   Tejeda, Rick O ^a   Engelstad, Roxann L ^a   Lovell, Edward G ^a   Ray Chaudhuri, Avi ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (OPTICAL); ERROR ANALYSIS; FINITE ELEMENT METHOD; MASKS; MATHEMATICAL MODELS; OPTICAL MULTILAYERS; SEMICONDUCTOR DEVICE MANUFACTURE; STRESS ANALYSIS; SUBSTRATES; ULTRAVIOLET RADIATION;

PATTERN TRANSFER DISTORTIONS;

PHOTORESISTS;

EID: 0033699255     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)