One-step lithography for fabrication of multifunction diffractive structures with grey-tone mask

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 165-171

  Gao, Fuhua ^a   Yao, Jun ^a   Zeng, Yangsu ^a   Xie, Shiwei ^a   Guo, Yongkang ^a   Cui, Zheng ^b  

^a SICHUAN UNIVERSITY   (China)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

Beam sampling grating; Colour separation grating; Grey scale mask; Grey tone photolithography

Indexed keywords

COHERENT LIGHT; DIFFRACTION; DIFFRACTION GRATINGS; IMAGE PROCESSING; MASKS;

GREY SCALE MASKS;

PHOTOLITHOGRAPHY;

EID: 0036643730     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00527-0     Document Type: Conference Paper

References (6)

1. Diffractive optics for the NIF
2. Multiscale, multifunction diffractive structures wet etched into fused silica for high-laser damage threshold applications
3. Micro-optic fabrication using one-level grey-tone lithography
4. A new method to design half-tone mask for the fabrication of continuous micro relief structure
5. Characterization of positive photoresist
6. Computer simulation of optical lithography in VLSI fabrication