Characterisation of an industrial plasma immersion ion implantation reactor with a Langmuir probe and an energy-selective mass spectrometer

Surface and Coatings Technology

Volumn 156, Issue 1-3, 2002, Pages 119-124

  Kaeppelin, V ^a   Carrere M ^a   Torregrosa, F ^b   Mathieu, G ^b  

^a AIX MARSEILLE UNIVERSITÉ   (France)

^b Ion Beam Services   (France)

Author keywords

Nitrogen; Plasma immersion ion implantation; Pulsed; Radio frequency

Indexed keywords

BORON COMPOUNDS; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETERS; NITROGEN; PLASMA DENSITY;

LANGMUIR PROBE;

ION IMPLANTATION;

ION IMPLANTATION;

EID: 0036642165     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00075-0     Document Type: Article

References (11)