Controlling synthesis of Ti-O/Ti-N gradient films by PIII

Surface and Coatings Technology

Volumn 156, Issue 1-3, 2002, Pages 208-213

  Wen, F ^a   Dai, H ^a   Huang, N ^a   Sun, H ^a   Leng, Y X ^a   Chu, P K ^b  

^a SOUTHWEST JIAOTONG UNIVERSITY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Mass flow control (MFC); Plasma immersion ion implantation (PIII); Programmable logical control (PLC); Ti O Ti N gradient film

Indexed keywords

CARBON; COMPOSITION; GASES; ION IMPLANTATION; MICROHARDNESS; PLASMA APPLICATIONS; PROGRAMMABLE LOGIC CONTROLLERS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SYNTHESIS (CHEMICAL); TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

LOW-TEMPERATURE ISOTROPIC CARBON (LTIC); PLASMA-IMMERSION ION IMPLANTATION AND DEPOSITION (PIIID);

THIN FILMS;

COATING; CUTTING TOOL; FILM; ION IMPLANTATION; PLASMA TREATMENT; TITANIUM NITRIDE; WEAR RESISTANCE;

EID: 0036641585     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00088-9     Document Type: Article

References (11)