Ion beam lithography using membrane masks

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4141-4145

  Kim, Young Suk ^a   Hong, Wan ^a   Woo, Hyung Joo ^a   Choi, Han Woo ^a   Kim, Gi Dong ^a   Lee, Jin Ho ^a   Lee, Samkeun ^a  

^a Korea Institute of Geosceince and Mineral Resources   (South Korea)

Author keywords

Angular spread; Channeling mask; Ion beam lithography; Membrane mask; Proton beam

Indexed keywords

COMPUTER SIMULATION; FABRICATION; MASKS; MEMBRANES; PHOTORESISTS; PROTON BEAMS; PROTON IRRADIATION; PROTONS;

NEXT GENERATION LITHOGRAPHY (NGL);

ION BEAM LITHOGRAPHY;

EID: 0036614761     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4141     Document Type: Article

References (7)