Top antireflective coating process for 193 nm lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4051-4054

  Takano, Yusuke ^a   Ijima, Kazuyo ^a   Akiyama, Yasushi ^b   Tanaka, Hatsuyuki ^b   Chen, Harrison ^b   Ho, Bang Chein ^a  

^a AZ Electronic Materials   (Japan)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

193 nm; Antireflective coating; AZ AQUATAR VI; Contact; Lithography; Photoresist; Swing suppression; Top ARC

Indexed keywords

ANTIREFLECTION COATINGS; COMPUTER SIMULATION; CONTAMINATION; ETCHING; REFRACTIVE INDEX;

SWING SUPPRESSION;

PHOTORESISTS;

EID: 0036614415     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4051     Document Type: Article

References (9)