A combined molecular dynamics and kinetic Monte Carlo calculation to study sputter erosion and beam assisted deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 193, Issue 1-4, 2002, Pages 352-358

  Betz, G ^a   Husinsky, W ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Cu(1 0 0); Epitaxy; Kinetic Monte Carlo; Molecular dynamics; Sputtering; Thin film formation

Indexed keywords

ANNEALING; COPPER; EPITAXIAL GROWTH; EROSION; FILM GROWTH; ION BOMBARDMENT; MOLECULAR DYNAMICS; MONTE CARLO METHODS; SPUTTERING; THERMAL DIFFUSION;

SPUTTER EROSIN;

ION BEAM ASSISTED DEPOSITION;

EID: 0036609339     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)00804-2     Document Type: Conference Paper

References (15)