Synchrotron-radiation X-ray topography of surface strain in large-diameter silicon wafers

Journal of Synchrotron Radiation

Volumn 9, Issue 3, 2002, Pages 166-168

  Kawado, S ^a   Iida, S ^a   Yamaguchi, S ^a   Kimura, S ^a   Hirose, Y ^a   Kajiwara, K ^a   Chikaura, Y ^a   Umeno, M ^a  

^a RIGAKU CORPORATION   (Japan)

Author keywords

Asymmetric reflection; Silicon wafers; Surface strain; X ray topography

Indexed keywords

CONFERENCE PAPER;

EID: 0036587155     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049502003448     Document Type: Conference Paper

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