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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 5 A, 2002, Pages 2859-2863

Structural and morphological evolution emerging in Si surface layers upon high-current Tb-ion implantation

(2) Cheng, Xiang Qian a Liu, Bai Xin a

a TSINGHUA UNIVERSITY (China)

Author keywords

Ion implantation; Metal silicide; Surface morphology; TbSi2 phase; Terbium

Indexed keywords

ION BEAMS; ION IMPLANTATION; ION SOURCES; LOW TEMPERATURE EFFECTS; MORPHOLOGY; SEMICONDUCTING SILICON; TERBIUM COMPOUNDS;

METAL SILICIDE;

CRYSTAL STRUCTURE;

EID: 0036578067 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.2859 Document Type: Article

Times cited : (3)

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