Effects of deionized water pressure and purified nitrogen gas on the chemical mechanical polishing process

Journal of Materials Science: Materials in Electronics

Volumn 13, Issue 5, 2002, Pages 299-302

  Kim, Sang Yong ^a   Jeong, So Young ^b   Seo, Yong Jin ^b  

^a ANAM Semiconductor Co Inc   (South Korea)

^b Daebul University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; DIELECTRIC PROPERTIES; IMPURITIES; IONIZATION OF LIQUIDS; NITROGEN; WATER;

DEIONIZED WATER PRESSURE;

CHEMICAL MECHANICAL POLISHING;

EID: 0036575266     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1015524009343     Document Type: Article

References (10)