Incident ion monitoring during plasma immersion ion implantation by direct measurements of high-energy secondary electrons

Surface and Coatings Technology

Volumn 93, Issue 2-3, 1997, Pages 242-246

  Nakamura, K ^a,b   Mandl S ^a   Brutscher, J ^a   Gunzel R ^a   Moller W ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Ion monitoring; Plasma immersion ion implantation; Scintillation; Secondary electron

Indexed keywords

ELECTRON EMISSION; PLASMA SHEATHS; SCINTILLATION;

PLASMA IMMERSION ION IMPLANTATION (PIII); SECONDARY ELECTRON EMISSION COEFFICIENT;

ION IMPLANTATION;

EID: 0031219765     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00053-4     Document Type: Article

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