Diffusion of Ag implanted into the AZ1350 photoresist

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 191, Issue 1-4, 2002, Pages 690-694

  Soares, M R F ^a   Amaral, L ^a   Behar, M ^a   Fink, D ^b  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

Ag diffusion; Ion implantation; Photoresist

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CHARACTERIZATION; DIFFUSION; ION IMPLANTATION; RADIATION DAMAGE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILVER;

CLUSTER FORMATION;

PHOTORESISTS;

EID: 0036574797     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)00634-1     Document Type: Article

References (12)